Technique: 2D Materials

The MultiPrep™ System is a programmable machine that enables precise semiautomatic sample preparation of a wide range of materials for microscopic (optical, SEM, FIB, TEM, AFM, etc.) evaluation.

Capabilities (from Allied’s brochure):

• Capabilities include parallel polishing, angle polishing, site-specific polishing or any combination thereof.
• Dual micrometers (pitch and roll) allow precise sample tilt adjustments relative to the abrasive plane.
• A rigid Z-indexing spindle maintains the predefined geometric orientation throughout the grinding/polishing process.
• Digital indicators enable quantifiable material removal, which can be monitored real-time (front), or preset (rear) for unattended operation.
• Variable speed rotation and oscillation maximize use of the entire grinding/ polishing disc and minimize artifacts.
• Adjustable load control expands its capability to handle a range of small (delicate) to large samples.
• Dual micrometers (pitch and roll) allow precise sample tilt adjustments relative to the abrasive plane.

Location

NanoES G65B

Primary Contact

Click here to view the facility contacts.

See the manufacturer’s brochure for more product information:

The MEM·C Facilities feature a custom-built, integrated system tailored for creating, probing and stacking air-sensitive 2D materials. The entire 2D production line, turning crystals into encapsulated stacked heterostructures, is fully contained in a connected chain of Ar-filled glove boxes (<0.1 ppm O₂ and H₂O).

There are two 8 glove-glove box workstations in the MSF room, each houses a fully automated HQ Graphene transfer stage, hotplate, and sample storage. One of the gloveboxes also houses the Bruker Edge AFM.

The HQ Graphene stages are primarily confiuged for VdW heterostructure fabrication but the setup is amenable to a wider range of nanomanipulation needs (i.e. device surgery using needle probes).

Additionally, the 2D Foundry includes a 4-glove solvent glovebox with a microscope, wide array of general use moisture-free solvents (IPA, Acetone, DCM, NMP) for air sensitive wash-off procedures.

Location

NanoES G65B

Primary Contact

Click here to view the facility contacts.

Specifications and Research Highlights

Click here to view an instrument highlight.